Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source
✍ Scribed by Chandan Kumar Chakrabarty
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 243 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0263-2241
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✦ Synopsis
The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N 2 and H 2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown.