## Abstract Silicon oxynitride (SiO~x~ N~y~) thin films were deposited on silicon substrates by ionโassisted deposition. Variable angle spectroscopic ellipsometry (VASE) was used to optically characterize the deposited film properties, such as layer thickness and composition, film surface and inter
โฆ LIBER โฆ
Characterization of silica xerogel films by variable-angle spectroscopic ellipsometry and infrared spectroscopy
โ Scribed by Himcinschi, C; Friedrich, M; Murray, C; Streiter, I; Schulz, S E; Gessner, T; Zahn, D R T
- Book ID
- 111652880
- Publisher
- Institute of Physics
- Year
- 2001
- Tongue
- English
- Weight
- 202 KB
- Volume
- 16
- Category
- Article
- ISSN
- 0268-1242
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