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Characterization of Optical Thin Films by Spectroscopic Ellipsometry

✍ Scribed by Susan Trolier-McKinstry; Pong Chindaudom; Kuppuswami Vedam; Basavaraj V. Hiremath


Book ID
110826982
Publisher
John Wiley and Sons
Year
1995
Tongue
English
Weight
544 KB
Volume
78
Category
Article
ISSN
0002-7820

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## Abstract Silicon oxynitride (SiO~x~ N~y~) thin films were deposited on silicon substrates by ion‐assisted deposition. Variable angle spectroscopic ellipsometry (VASE) was used to optically characterize the deposited film properties, such as layer thickness and composition, film surface and inter