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Characterization of interfacial reaction and chemical bonding features of LaOx/HfO2 stack structure formed on thermally-grown SiO2/Si(1 0 0)

✍ Scribed by Akio Ohta; Daisuke Kanme; Hideki Murakami; Seiichiro Higashi; Seiichi Miyazaki

No coin nor oath required. For personal study only.

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Characterization of interfacial reaction and chemical bonding features of LaOx/HfO2 stack structure formed on thermally-grown SiO2/Si(1&#xa0;0&#xa0;0)