Preparation of hafnium oxide thin film b
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Su Xing; Ninglin Zhang; Zhitang Song; Qinwo Shen; Chenlu Lin
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Article
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2003
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Elsevier Science
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English
โ 152 KB
Electron beam evaporation was employed to deposit hafnium on silicon (100) substrate, followed by a rapid thermal oxidation process to fabricate hafnium dioxide thin film. Hafnium was transformed to hafnium oxide above a oxidizing temperature of 500 8C. An interfacial layer of hafnium silicate was o