Characterization of chromium thin films by sputter deposition
β Scribed by Sea-Fue Wang; Hsui-Chi Lin; Hui-Yun Bor; Yi-Lung Tsai; Chao-Nan Wei
- Book ID
- 116608799
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 728 KB
- Volume
- 509
- Category
- Article
- ISSN
- 0925-8388
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π SIMILAR VOLUMES
To obtain a suitable ohmic contact with the lowest resistivity, chromium (Cr) thin films were deposited on transparent conductive oxide indium tin oxide (ITO) by RF sputtering method in argon atmosphere and its electrical properties were optimized. The deposition of Cr thin film has been performed f
Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper