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Sputter deposition and characterization of Mn3CuN thin films

✍ Scribed by Aoyama, Masahiro; Takenaka, Koshi; Ikuta, Hiroshi


Book ID
121782702
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
628 KB
Volume
577
Category
Article
ISSN
0925-8388

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Characterization of NiO thin films depos
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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper