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Characterization and Optimization of Sub-32-nm FinFET Devices for ESD Applications

✍ Scribed by Thijs, S.; Tremouilles, D.; Russ, C.; Griffoni, A.; Collaert, N.; Rooyackers, R.; Linten, D.; Scholz, M.; Duvvury, C.; Gossner, H.; Jurczak, M.; Groeseneken, G.

Book ID: 114619229
Publisher: IEEE
Year: 2008
Tongue: English
Weight: 482 KB
Volume: 55
Category: Article
ISSN: 0018-9383
DOI: 10.1109/ted.2008.2006547

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