✦ LIBER ✦
Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application
✍ Scribed by Y.L Cheng; Y.L Wang; C.W Liu; Y.L Wu; K.Y Lo; C.P Liu; J.K Lan
- Book ID
- 117226592
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 796 KB
- Volume
- 398-399
- Category
- Article
- ISSN
- 0040-6090
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