✦ LIBER ✦
Device- and Circuit-Level Variability Caused by Line Edge Roughness for Sub-32-nm FinFET Technologies
✍ Scribed by Leung, G.; Lai, L.; Gupta, P.; Chui, C. O.
- Book ID
- 114621017
- Publisher
- IEEE
- Year
- 2012
- Tongue
- English
- Weight
- 674 KB
- Volume
- 59
- Category
- Article
- ISSN
- 0018-9383
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