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Characterization and device applications of ZnO films deposited by high power impulse magnetron sputtering (HiPIMS)

✍ Scribed by Partridge, J G; Mayes, E L H; McDougall, N L; Bilek, M M M; McCulloch, D G

Book ID
121437738
Publisher
Institute of Physics
Year
2013
Tongue
English
Weight
388 KB
Volume
46
Category
Article
ISSN
0022-3727

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## Abstract The emerging technology of High Power Impulse Magnetron Sputtering (HIPIMS) has much in common with the more established technology of Plasma‐Based Ion Implantation & Deposition (PBIID): both use pulsed plasmas, the pulsed sheath periodically evolves and collapses, the plasma‐sheath sys