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Characteristics of SiOX thin films deposited by atmospheric pressure chemical vapor deposition using a double-discharge system

โœ Scribed by Jaebeom Park; Jongsik Oh; Elly Gil; Geun Young Yeom


Book ID
119322490
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
378 KB
Volume
47
Category
Article
ISSN
0025-5408

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