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Optical recording characteristics of tin nitride thin films prepared by an atmospheric pressure halide chemical vapor deposition

✍ Scribed by Naoyuki Takahashi; Masahisa Takekawa; Tadashi Takahashi; Takato Nakamura; Masayuki Yoshioka; Wataru Inami; Yoshimasa Kawata

No coin nor oath required. For personal study only.

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