Study of atmospheric pressure chemical vapor deposition by using a double discharge system for SiOxthin-film deposition with a HMDS/Ar/He/O2gas mixture

✍ Scribed by Ga Young Kim, Jae Beom Park, Geun Young Yeom

• Book ID: 119937175
• Publisher: The Korean Physical Society
• Year: 2012
• Tongue: English
• Weight: 269 KB
• Volume: 61
• Category: Article
• ISSN: 0374-4884
• DOI: 10.3938/jkps.61.397