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Characteristics of doped oxides and their use in silicon device fabrication

✍ Scribed by D.M. Brown; M. Garfinkel; M. Ghezzo; E.A. Taft; A. Tenney; J. Wong

Publisher: Elsevier Science
Year: 1972
Tongue: English
Weight: 853 KB
Volume: 17
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(72)90258-8

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