✦ LIBER ✦
MOS device fabrication using sputter-deposited gate oxide and polycrystalline silicon layers
✍ Scribed by K. Haberle; E. Fröschle
- Publisher
- Elsevier Science
- Year
- 1980
- Tongue
- English
- Weight
- 792 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0038-1101
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