A dc magnetron system for cathode sputtering with a spool-shaped cathode is described. In comparison with the cylindrical cathode, the spool-shaped cathode increases the intensity of the discharge by one order of magnitude for gas pressures of 10 -2 to IO -3 torr. The main characteristics of the sys
โฆ LIBER โฆ
Cathode cooling apparatus for a planar magnetron sputtering system
โ Scribed by Lake, M. R.
- Book ID
- 126932021
- Publisher
- AVS (American Vacuum Society)
- Year
- 1984
- Tongue
- English
- Weight
- 512 KB
- Volume
- 2
- Category
- Article
- ISSN
- 0734-2101
- DOI
- 10.1116/1.572372
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