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Carbon nitride thin films deposited by the reactive ion beam sputtering technique

✍ Scribed by Satoshi Kobayashi; Shinji Nozaki; Hiroshi Morisaki; Shigeo Fukui; Susumu Masaki

Book ID: 113205338
Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 423 KB
Volume: 281-282
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(96)08655-5

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