Capacitance–Voltage Characterization of AlN MIS Structures Grown on 6H-SiC(0001) Substrates by MOCVD
✍ Scribed by W. Hageman; A. Rys; J. Schmitt; J.H. Edgar; B. Liu; D.D. Koleske
- Book ID
- 104556422
- Publisher
- John Wiley and Sons
- Year
- 2003
- Tongue
- English
- Weight
- 80 KB
- Volume
- 0
- Category
- Article
- ISSN
- 1862-6351
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
Hydrogen-etching of 6H-SiC(0001) substrates removed mechanical polishing damage and produced an array of parallel, unit cell high steps. The initial stage of AlN deposition on these etched substrates occurred via island nucleation, both on step edges and on terraces. Coalesced AlN films did not show
## Abstract 250 nm thick AlN layers without a nucleation layer were grown directly on 6H‐SiC(0001) with 3‐bilayer‐height steps by rf‐plasma‐assisted molecular‐beam epitaxy. The structure and morphology of the AlN layers have been studied using atomic force microscopy, X‐ray diffraction and transmis