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Buried layers of silicon oxy-nitride fabricated using ion beam synthesis

✍ Scribed by K.J. Reeson; P.L.F. Hemment; C.D. Meekison; C.D. Marsh; G.R. Booker; R.J. Chater; J.A. Kilner; J. Davis

No coin nor oath required. For personal study only.

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