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Bulk silicon micromachining using porous silicon sacrificial layers

โœ Scribed by G. Kaltsas; A.G. Nassiopoulos

Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
230 KB
Volume
35
Category
Article
ISSN
0167-9317

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โœฆ Synopsis

A bulk silicon micromachining technique using porous silicon as a sacrificial layer is developed. The proposed process is fully C-MOS compatible and it was successfully used to fabricate deep cavities into silicon with very smooth bottom surfaces and sidewalls. Suspended fiat polysilicon membranes were also produced of a surface as large as 230 x 550 pm 2, as well as polysilicon cantilevers. This process opens important possibilities in silicon integrated sensor fabrication.

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