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Boron and phosphorus doping of a-SiC:H thin films by means of ion implantation

✍ Scribed by F. Demichelis; G. Crovini; C.F. Pirri; E. Tresso; R. Galloni; C. Summonte; R. Rizzoli; F. Zignani; P. Rava

No coin nor oath required. For personal study only.

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