Border trap characterization in amorphous indium-gallium-zinc oxide thin-film transistors with SiOX and SiNX gate dielectrics

✍ Scribed by Jeong, Chan-Yong; Lee, Daeun; Song, Sang-Hun; Cho, In-Tak; Lee, Jong-Ho; Cho, Eou-Sik; Kwon, Hyuck-In

• Book ID: 121705098
• Publisher: American Institute of Physics
• Year: 2013
• Tongue: English
• Weight: 830 KB
• Volume: 103
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.4824118