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Bistable behavior of silicon wafer in rapid thermal processing setup

✍ Scribed by V.I. Rudakov; V.V. Ovcharov; A.L. Kurenya; V.P. Prigara

Book ID: 113797930
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 606 KB
Volume: 93
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2011.11.018

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