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Behavior of oxygen in the crystal formation and heat treatment of silicon heavily doped with antimony

โœ Scribed by T. Nozaki; Y. Itoh; T. Masui; T. Abe


Book ID
123616068
Publisher
American Institute of Physics
Year
1986
Tongue
English
Weight
551 KB
Volume
59
Category
Article
ISSN
0021-8979

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