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Automatic monitoring of deposition conditions during rf sputtering of dielectric materials

✍ Scribed by CW Pitt; IH Kirk; RJ Stevens

Publisher: Elsevier Science
Year: 1975
Tongue: English
Weight: 736 KB
Volume: 25
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(75)90002-0

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