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Atomic - vapour - deposited HfO2 and Sr4Ta2O9 layers for metal-insulator-metal applications

✍ Scribed by M. Lukosius; Ch. Wenger; T. Schroeder; J. Dabrowski; R. Sorge; I. Costina; H.-J. Müssig; S. Pasko; Ch. Lohe

Book ID: 104051722
Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 337 KB
Volume: 84
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2007.04.024

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