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Reactively sputtered HfO2 and Ba(Zr0.2Ti0.8)O3–HfO2 dielectrics for metal–insulator–metal capacitor applications

✍ Scribed by Zhang, Li-Feng; Xu, Hui; Zhang, Qiu-Xiang; Ding, Shi-Jin; Zhang, David Wei

No coin nor oath required. For personal study only.

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