Atomic Layer Deposition of Zirconium Titanium Oxide from Titanium Isopropoxide and Zirconium Chloride
✍ Scribed by Rahtu, Antti; Ritala, Mikko; Leskelä, Markku
- Book ID
- 127113363
- Publisher
- American Chemical Society
- Year
- 2001
- Tongue
- English
- Weight
- 76 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0897-4756
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TiO 2 thin films have been grown on amorphous soda lime glass and polycrystalline silicon substrates from TiI 4 and H 2 O 2 by atomic layer deposition (ALD) in the temperature range 250±490 C. The film growth rate and refractive index increased linearly with growth temperature up to 300 C. Between 3
Atomic layer deposition ALD of titanium oxide from titanium isopropoxide Ti OCH CH and water as well as 3 2 4 Ž Ž . . Ž . from Ti OCH CH and hydrogen peroxide H O was studied. According to data of real-time quartz crystal 3 2 4 2 2 Ž . Ž Ž . . microbalance QCM measurements, adsorption of Ti OCH CH w