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Atomic layer deposition of hafnium oxide dielectrics on silicon and germanium substrates

✍ Scribed by D. W. McNeill; S. Bhattacharya; H. Wadsworth; F. H. Ruddell; S. J. N. Mitchell; B. M. Armstrong; H. S. Gamble

Publisher
Springer US
Year
2007
Tongue
English
Weight
361 KB
Volume
19
Category
Article
ISSN
0957-4522

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