Use of the βmistβ (liquid-source) deposi
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F.D. Morrison; J.F. Scott; M. Alexe; T.J. Leedham; T. Tatsuta; O. Tsuji
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Article
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2003
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Elsevier Science
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English
β 574 KB
We describe the application of misted chemical solution deposition (CSD) techniques to processing of ferroelectric-filled porous silicon photonic devices and of novel precursor medium-and high-dielectric constant films for gate oxide and memory applications.