✦ LIBER ✦
Use of the ‘mist’ (liquid-source) deposition system to produce new high-dielectric devices: ferroelectric-filled photonic crystals and Hf-oxide and related buffer layers for ferroelectric-gate FETs
✍ Scribed by F.D. Morrison; J.F. Scott; M. Alexe; T.J. Leedham; T. Tatsuta; O. Tsuji
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 574 KB
- Volume
- 66
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.
✦ Synopsis
We describe the application of misted chemical solution deposition (CSD) techniques to processing of ferroelectric-filled porous silicon photonic devices and of novel precursor medium-and high-dielectric constant films for gate oxide and memory applications.