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Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

✍ Scribed by Kaupo Kukli; Mikko Ritala; Tero Pilvi; Titta Aaltonen; Jaan Aarik; Markus Lautala; Markku Leskelä

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 247 KB
Volume: 118
Category: Article
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2004.12.020

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