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Atmospheric pressure deposition of fluorine-doped SnO2 thin films from organotin fluorocarboxylate precursors

โœ Scribed by Mary F. Mahon; Kieran C. Molloy; Joanne E. Stanley; David W. H. Rankin; Heather E. Robertson; Blair F. Johnston


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
280 KB
Volume
19
Category
Article
ISSN
0268-2605

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๐Ÿ“œ SIMILAR VOLUMES


Atmospheric pressure chemical vapour dep
โœ Joanne E. Stanley; Anthony C. Swain; Kieran C. Molloy; David W. H. Rankin; Heath ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 251 KB ๐Ÿ‘ 1 views

13 , n = 1) have been synthesized, characterized by 1 H, 13 C, 19 F and 119 Sn NMR, and evaluated as precursors for the atmospheric pressure chemical vapour deposition of fluorine-doped SnO 2 thin films. All precursors were sufficiently volatile in the range 84-136 โ€ข C and glass substrate temperatur

Atmospheric pressure chemical vapour dep
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## Abstract The monomeric tungsten oxoโ€fluoroalkoxide W(O)(CH~2~CF~3~)~4~ (1) was synthesized from W(O)Cl~4~ and CF~3~CH~2~OH in the presence of ammonia. It was used in atmospheric pressure chemical vapour deposition experiments to deposit nonโ€stoichiometric WO~2.9~ when used as a singleโ€source pre