𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Atmospheric pressure deposition of F-doped SnO2 thin films from organotin fluoroalkoxide precursors

✍ Scribed by Kieran C Molloy; Joanne E Stanley


Publisher
John Wiley and Sons
Year
2009
Tongue
English
Weight
173 KB
Volume
23
Category
Article
ISSN
0268-2605

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Atmospheric pressure chemical vapour dep
✍ Joanne E. Stanley; Anthony C. Swain; Kieran C. Molloy; David W. H. Rankin; Heath 📂 Article 📅 2005 🏛 John Wiley and Sons 🌐 English ⚖ 251 KB

13 , n = 1) have been synthesized, characterized by 1 H, 13 C, 19 F and 119 Sn NMR, and evaluated as precursors for the atmospheric pressure chemical vapour deposition of fluorine-doped SnO 2 thin films. All precursors were sufficiently volatile in the range 84-136 • C and glass substrate temperatur

Atmospheric pressure chemical vapour dep
✍ K. C. Molloy; P. A. Williams 📂 Article 📅 2008 🏛 John Wiley and Sons 🌐 English ⚖ 163 KB 👁 1 views

## Abstract The monomeric tungsten oxo‐fluoroalkoxide W(O)(CH~2~CF~3~)~4~ (1) was synthesized from W(O)Cl~4~ and CF~3~CH~2~OH in the presence of ammonia. It was used in atmospheric pressure chemical vapour deposition experiments to deposit non‐stoichiometric WO~2.9~ when used as a single‐source pre