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Atmospheric pressure chemical vapour deposition of NbSe2–TiSe2 composite thin films

✍ Scribed by Nicolas D. Boscher; Claire J. Carmalt; Ivan P. Parkin

Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
332 KB
Volume
256
Category
Article
ISSN
0169-4332

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Atmospheric Pressure CVD of TiSe2 Thin F
Atmospheric Pressure CVD of TiSe2 Thin Films on Glass
✍ N. D. Boscher; C. J. Carmalt; I. P. Parkin 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 341 KB 👁 1 views

Atmospheric pressure (AP) CVD of TiSe 2 films on glass substrates was achieved by reaction of di-tert-butylselenide and diethyl diselenide with TiCl 4 at 250-600 °C. All the films showed a TiSe 2 Raman pattern with bands at 133 cm -1 and 198 cm -1 . X-ray diffraction (XRD) showed that the TiSe 2 fil