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Aspects of TiN and Ti deposition in an ECR plasma enhanced CVD process

✍ Scribed by A. Weber; R. Nikulski; C.-P. Klages; M.E. Gross; R.M. Charatan; R.L. Opilan; W.L. Brown

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 512 KB
Volume: 91
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(95)00137-9

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