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Effect of temperature on the formation of surface layers in plasma-assisted chemical vapour deposition processes carried out in an atmosphere containing Ti(OiC3H7)4vapours

✍ Scribed by J. R. Sobiecki; T. Wierzchon; B. Kułakowska-Pawlak; W. Żyrnicki


Publisher
Springer
Year
1996
Tongue
English
Weight
1002 KB
Volume
15
Category
Article
ISSN
0261-8028

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