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Application of Ti: W barrier metallization for integrated circuits

✍ Scribed by P.B. Ghate; J.C. Blair; C.R. Fuller; G.E. McGuire

Publisher: Elsevier Science
Year: 1978
Tongue: English
Weight: 639 KB
Volume: 53
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(78)90024-x

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