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Application of Ru-based gate materials for CMOS technology

✍ Scribed by M. T˘apajna; P. Písec˘ny; R. Lupták; K. Hus˘eková; K. Fröhlich; L. Harmatha; J.C. Hooker; F. Roozeboom; J. Jergel

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 270 KB
Volume: 7
Category: Article
ISSN: 1369-8001
DOI: 10.1016/j.mssp.2004.09.011

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