Application of nanosphere lithography to charge trap flash memories with patterned Si3N4 trap layers

✍ Scribed by An, Ho-Myoung; Kim, Hee-Dong; You, Hee-Wook; Kim, Kyeong Heon; Sung, Yun Mo; Cho, Won-Ju; Kim, Tae Geun

• Book ID: 122481756
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 835 KB
• Volume: 98
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2012.07.061