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Dependence of charge trapping and tunneling on the silicon-nitride (Si[sub 3]N[sub 4]) thickness for tunnel barrier engineered nonvolatile memory applications

✍ Scribed by Jung, Myung-Ho; Kim, Kwan-Su; Park, Goon-Ho; Cho, Won-Ju


Book ID
121823917
Publisher
American Institute of Physics
Year
2009
Tongue
English
Weight
571 KB
Volume
94
Category
Article
ISSN
0003-6951

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