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Application aspects of a positive tone deep UV resist

✍ Scribed by Walter Spiess; Horst Röschert; Horst Wengenroth; Georg Pawlowski


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
391 KB
Volume
21
Category
Article
ISSN
0167-9317

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A new class of positive deep ultraviolet (vv) resists consisting of poly( pdisilanylenepheny1ene)s was developed, in which a disilanylene unit and a phenylene unit are connected alternatively in the polymer main chain. These resists had very high etching resistance against oxygen plasma. The lithogr