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Annealing studies of point defects in low dose MeV ion implanted silicon

✍ Scribed by J. Lalita; B.G. Svensson; C. Jagadish; A. Hallén

Book ID: 114168939
Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 508 KB
Volume: 127-128
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(96)01109-3

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