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Annealing-induced amorphization in a sputtered glass-forming film: In-situ transmission electron microscopy observation

โœ Scribed by Jinn P. Chu; Chiu-Yen Wang; L.J. Chen; Qi Chen


Book ID
104094961
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
842 KB
Volume
205
Category
Article
ISSN
0257-8972

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โœฆ Synopsis


The annealing-induced amorphization of a sputtered glass-forming Cu 51 Zr 42 Al 4 Ti 3 thin film has been clarified by in-situ transmission electron microscopy in conjunction with ex-situ atomic force microscopy and X-ray diffractometry. Upon heating of the film at low temperatures, nanocrystallization and growth of metastable sputtered crystallites occur in the amorphous matrix. Heated to 438 ยฐC, within the supercooled liquid region (ฮ”T), the film becomes fully amorphous. At higher temperatures above ฮ”T, i.e. 525 ยฐC, crystalline Cu 10 Zr 7 and AlTi 2 phases appear as a result of crystallization. The annealing-induced nanocrystallization and amorphization appear to be rather general and applicable to a large number of systems.


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