Al 2 O 3 /SiO 2 films have been deposited as UV antireflection coatings on 4H-SiC by electron-beam evaporation and characterized by reflection spectrum, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The reflectance of the Al 2 O 3 /SiO 2 films is 0.33% and 10 times l
โฆ LIBER โฆ
Annealing effects on the optical and structural properties of Al2O3/SiO2 films as UV antireflection coatings on 4H-SiC substrates
โ Scribed by Feng Zhang; Weifeng Yang; Aisuo Pang; Zhengyun Wu; Hongji Qi; Jianke Yao; Zhengxiu Fan; Jianda Shao
- Book ID
- 108060562
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 833 KB
- Volume
- 254
- Category
- Article
- ISSN
- 0169-4332
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