Silicon ions were implanted into SiO 2 thin films with various doses and energies. For the films implanted with various ion doses the photoluminescence (PL) intensity of 470 nm firstly increased with the increase of Si ion dose, which is similar to the variation trend of displacement per atom (DPA)
โฆ LIBER โฆ
Annealing effect on the photoluminescence of Si nanocrystallites thin films
โ Scribed by Kyung Ah Jeon; Jong Hoon Kim; Jin Baek Choi; Kyoung Bo Han; Sang Yeol Lee
- Book ID
- 108215877
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 310 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0928-4931
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