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Annealing characteristics of Si doped amorphous silica films by rf sputtering

✍ Scribed by S. Yoshida; T. Hanada; S. Tanabe; N. Soga

Book ID: 111534554
Publisher: Springer
Year: 1999
Tongue: English
Weight: 73 KB
Volume: 34
Category: Article
ISSN: 0022-2461
DOI: 10.1023/a:1004441203187

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