๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Annealing behavior of a void network in amorphous silicon

โœ Scribed by Iwao Ohdomari; Masahiro Ikeda; Hiroki Yoshimoto


Publisher
Elsevier Science
Year
1977
Tongue
English
Weight
258 KB
Volume
64
Category
Article
ISSN
0375-9601

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Anomalous annealing behavior of isolated
โœ S.E. Donnelly; R.C. Birtcher; V.M. Vishnyakov; P.D. Edmondson; G. Carter ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 141 KB

The formation and annealing of individual amorphous zones in silicon have been studied using in situ transmission electron microscopy. This technique enables us to identify anomalous behavior that cannot be deduced from statistical studies. Zones were formed at room temperature by impacts of single