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Angular distribution of intensity of reflected radiation investigations of the influence of CO2 laser treatment on optical properties of hydrogenated amorphous silicon

โœ Scribed by A. Grabowski; J. Jaglarz; M. Nowak


Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
309 KB
Volume
30
Category
Article
ISSN
0030-3992

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โœฆ Synopsis


Thin ยฎlms of hydrogenated amorphous silicon (a-Si:H) were annealed using CO 2 laser radiation (l = 10.6 mm). Changes of optical properties of the treated a-Si:H were investigated using optical transmittance spectroscopy and the angular distribution of intensity of reยฏected radiation (ADIRR). The CO 2 laser annealing inยฏuences the spectral characteristics of the real part of refractive index n and absorption coecient a of light in a-Si:H. This treatment increases the n and a values as well as the Urbach energy of a-Si:H. Simultaneously it decreases the optical energy gap of this material. The changes of optical parameters at the interfaces of a-Si:Hยฑglass substrate and a-Si:Hยฑair were established.


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